SHIN, Jin Kyeong; EUN, Su Min; CHOI, Yeong Tae; CHOI, Byung Joon. UV Pulse Sequence-Dependent Properties of Al2O3 Films Via UV-Assisted Atomic Layer Deposition. Archives of Metallurgy and Materials, [S. l.], v. 71, n. 2, p. 523–526, 2026. DOI: 10.24425/amm.2026.158833. Disponível em: https://wydawnictwo.pan.pl/index.php/amm/article/view/2163. Acesso em: 21 aug. 2026.