RÓŻYCKA, Marta; JASIK, Agata; KOZŁOWSKI, Paweł; BRACHA, Krzysztof; RATAJCZAK, Jacek; WIERZBICKA-MIERNIK, Anna. The use of one-component plasma in the ICP-RIE etching process of periodic structures for applications in photodetector arrays. Metrology and Measurement Systems, [S. l.], v. 30, n. 4, p. 809–819, 2023. DOI: 10.24425/mms.2023.147955. Disponível em: https://wydawnictwo.pan.pl/index.php/mms/article/view/5248. Acesso em: 15 oct. 2026.