RAMOS, David et al. Two-step etch in n-on-p type-II superlattices for surface leakage reduction in mid-wave infrared megapixel detectors. Opto-Electronics Review, [S. l.], p. e144556, 2026. DOI: 10.24425/opelre.2023.144556. Disponível em: https://wydawnictwo.pan.pl/index.php/opelre/article/view/437. Acesso em: 17 apr. 2026.