[1]
M. Szindler, M. M. Szindler, J. Orwat, and G. Kulesza-Matlak, “The Al₂O₃/TiO₂ double antireflection coating deposited by the ALD method”, Opto-Electron. Rev., vol. 30, no. 3, p. e141952, Mar. 2026.