Szindler M, Szindler MM. Application of Al₂O₃ ZnO, and TiO₂ ALD thin films as antireflection coating in the silicon solar cells. Opto-Electron. Rev. [Internet]. 2026 Mar. 13 [cited 2026 Apr. 17];31(4):e148223. Available from: https://wydawnictwo.pan.pl/index.php/opelre/article/view/489