Szindler M, Szindler MM, Orwat J, Kulesza-Matlak G. The Al₂O₃/TiO₂ double antireflection coating deposited by the ALD method. Opto-Electron. Rev. [Internet]. 2022 Sep. 30 [cited 2026 Aug. 18];30(3):e141952. Available from: https://wydawnictwo.pan.pl/index.php/opelre/article/view/532